Near room temperature plasma enhanced atomic layer deposition of ruthenium using the RuO4-precursor and H2-plasma

Title
Near room temperature plasma enhanced atomic layer deposition of ruthenium using the RuO4-precursor and H2-plasma
Authors
Keywords
-
Journal
Journal of Materials Chemistry C
Volume 3, Issue 19, Pages 4848-4851
Publisher
Royal Society of Chemistry (RSC)
Online
2015-04-21
DOI
10.1039/c5tc00751h

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