The low temperature atomic layer deposition of ruthenium and the effect of oxygen exposure

Title
The low temperature atomic layer deposition of ruthenium and the effect of oxygen exposure
Authors
Keywords
-
Journal
JOURNAL OF MATERIALS CHEMISTRY
Volume 22, Issue 48, Pages 25154
Publisher
Royal Society of Chemistry (RSC)
Online
2012-10-01
DOI
10.1039/c2jm35332f

Ask authors/readers for more resources

Find Funding. Review Successful Grants.

Explore over 25,000 new funding opportunities and over 6,000,000 successful grants.

Explore

Become a Peeref-certified reviewer

The Peeref Institute provides free reviewer training that teaches the core competencies of the academic peer review process.

Get Started