Impact of the Plasma Ambient and the Ruthenium Precursor on the Growth of Ruthenium Films by Plasma Enhanced Atomic Layer Deposition

Published 2012 View Full Article

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Title
Impact of the Plasma Ambient and the Ruthenium Precursor on the Growth of Ruthenium Films by Plasma Enhanced Atomic Layer Deposition
Authors
Keywords
-
Journal
ECS Solid State Letters
Volume 1, Issue 2, Pages P19-P21
Publisher
The Electrochemical Society
Online
2012-08-01
DOI
10.1149/2.003202ssl

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