Tin oxide atomic layer deposition from tetrakis(dimethylamino)tin and water

Portable atomic layer deposition reactor for in situ synchrotron photoemission studies

(2013) R. Methaapanon et al.   REVIEW OF SCIENTIFIC INSTRUMENTS

Atomic layer deposition of tin oxide with nitric oxide as an oxidant gas

(2012) Jaeyeong Heo et al.   JOURNAL OF MATERIALS CHEMISTRY

Structural characteristics of epitaxial SnO2 films deposited on a- and m-cut sapphire by ALD

(2011) Dai Hong Kim et al.   JOURNAL OF CRYSTAL GROWTH

Atomic Layer Deposition of Tin Monosulfide Thin Films

(2011) Prasert Sinsermsuksakul et al.   Advanced Energy Materials

Tin Dioxide Sensing Layer Grown on Tubular Nanostructures by a Non-Aqueous Atomic Layer Deposition Process

(2010) Catherine Marichy et al.   ADVANCED FUNCTIONAL MATERIALS

Transparent Conducting Oxides in the ZnO-In2O3-SnO2System

(2010) Cathleen A. Hoel et al.   CHEMISTRY OF MATERIALS

Low Temperature Atomic Layer Deposition of Tin Oxide

(2010) Jaeyeong Heo et al.   CHEMISTRY OF MATERIALS

Tin Monosulfide Thin Films Grown by Atomic Layer Deposition Using Tin 2,4-Pentanedionate and Hydrogen Sulfide

(2010) Jay Yu Kim et al.   Journal of Physical Chemistry C

Area Selective Atomic Layer Deposition by Microcontact Printing with a Water-Soluble Polymer

(2010) Marja N. Mullings et al.   JOURNAL OF THE ELECTROCHEMICAL SOCIETY

?The Degradation of Deposition Blocking Layer during Area Selective Plasma Enhanced Atomic Layer Deposition of Cobalt

(2010) Hyungjun Kim et al.   JOURNAL OF THE KOREAN PHYSICAL SOCIETY

Atomic Layer Deposition: An Overview

(2009) Steven M. George   CHEMICAL REVIEWS

Area-Selective ALD with Soft Lithographic Methods: Using Self-Assembled Monolayers to Direct Film Deposition

(2009) Xirong Jiang et al.   Journal of Physical Chemistry C

Area-Selective Atomic Layer Deposition Using Self-Assembled Monolayer and Scanning Probe Lithography

(2009) Wonyoung Lee et al.   JOURNAL OF THE ELECTROCHEMICAL SOCIETY

Blocking the Lateral Film Growth at the Nanoscale in Area-Selective Atomic Layer Deposition

(2008) Robin H. A. Ras et al.   JOURNAL OF THE AMERICAN CHEMICAL SOCIETY

Atomic Layer Deposition of Metal Oxides on Pristine and Functionalized Graphene

(2008) Xinran Wang et al.   JOURNAL OF THE AMERICAN CHEMICAL SOCIETY

Atomic layer deposition of tin oxide films using tetrakis(dimethylamino) tin

(2008) Jeffrey W. Elam et al.   JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A

Nanopatterning materials using area selective atomic layer deposition in conjunction with thermochemical surface modification via heated AFM cantilever probe lithography

(2008) Yueming Hua et al.   MICROELECTRONIC ENGINEERING

Ru nanostructure fabrication using an anodic aluminum oxide nanotemplate and highly conformal Ru atomic layer deposition

(2008) Woo-Hee Kim et al.   NANOTECHNOLOGY

Present status of transparent conducting oxide thin-film development for Indium-Tin-Oxide (ITO) substitutes

(2007) Tadatsugu Minami   THIN SOLID FILMS