Area-Selective ALD with Soft Lithographic Methods: Using Self-Assembled Monolayers to Direct Film Deposition

Published 2009 View Full Article

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Title
Area-Selective ALD with Soft Lithographic Methods: Using Self-Assembled Monolayers to Direct Film Deposition
Authors
Keywords
-
Journal
Journal of Physical Chemistry C
Volume 113, Issue 41, Pages 17613-17625
Publisher
American Chemical Society (ACS)
Online
2009-09-03
DOI
10.1021/jp905317n

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