Competing reactions during metalorganic deposition: Ligand-exchange versus direct reaction with the substrate surface

Reactivity of selectively terminated single crystal silicon surfaces

(2010) Kathryn A. Perrine et al.   CHEMICAL SOCIETY REVIEWS

Thermal Stability of Precursors for Atomic Layer Deposition of TiO2, ZrO2, and HfO2: An Ab Initio Study of α-Hydrogen Abstraction in Bis-cyclopentadienyl Dimethyl Complexes

(2010) Aleksandra Zydor et al.   JOURNAL OF PHYSICAL CHEMISTRY A

Metallic Nanostructure Formation Limited by the Surface Hydrogen on Silicon

(2010) Kathryn A. Perrine et al.   LANGMUIR

Qualitative and quantitative analysis of complex temperature-programmed desorption data by multivariate curve resolution

(2010) Juan Carlos F. Rodríguez-Reyes et al.   SURFACE SCIENCE

Surface Chemistry for Molecular Layer Deposition of Organic and Hybrid Organic−Inorganic Polymers

(2009) Steven M. George et al.   ACCOUNTS OF CHEMICAL RESEARCH

Atomic Layer Deposition: An Overview

(2009) Steven M. George   CHEMICAL REVIEWS

Reversible Tuning of the Surface Chemical Reactivity of Titanium Nitride and Nitride−Carbide Diffusion Barrier Thin Films

(2009) Juan Carlos F. Rodríguez-Reyes et al.   CHEMISTRY OF MATERIALS

Molecular Layer Deposition of Hybrid Organic−Inorganic Alucone Polymer Films Using a Three-Step ABC Reaction Sequence

(2009) Byunghoon Yoon et al.   CHEMISTRY OF MATERIALS

Uptake of Copper Acetamidinate ALD Precursors on Nickel Surfaces

(2009) Qiang Ma et al.   CHEMISTRY OF MATERIALS

Computational Method for Efficient Screening of Metal Precursors for Nanomaterial Syntheses

(2009) Yuuichi Orimoto et al.   INDUSTRIAL & ENGINEERING CHEMISTRY RESEARCH

Quartz Crystal Microbalance Studies of Al2O3Atomic Layer Deposition Using Trimethylaluminum and Water at 125 °C†

(2009) R. A. Wind et al.   JOURNAL OF PHYSICAL CHEMISTRY A

In Situ Infrared Characterization during Atomic Layer Deposition of Lanthanum Oxide

(2009) Jinhee Kwon et al.   Journal of Physical Chemistry C

Copper−Metal Deposition on Self Assembled Monolayer for Making Top Contacts in Molecular Electronic Devices

(2009) Oliver Seitz et al.   JOURNAL OF THE AMERICAN CHEMICAL SOCIETY

Atomic Layer Deposition of Aluminum Oxide Thin Films from a Heteroleptic, Amidinate-Containing Precursor

(2008) Allison L. Brazeau et al.   CHEMISTRY OF MATERIALS

Molecular Layer Deposition of Alucone Polymer Films Using Trimethylaluminum and Ethylene Glycol

(2008) A. A. Dameron et al.   CHEMISTRY OF MATERIALS

On the relative stability of cobalt- and nickel-based amidinate complexes against β-migration

(2008) Jiaye Li et al.   INTERNATIONAL JOURNAL OF QUANTUM CHEMISTRY

Mechanisms of adsorption and decomposition of metal alkylamide precursors for ultrathin film growth

(2008) Juan Carlos F. Rodríguez-Reyes et al.   JOURNAL OF APPLIED PHYSICS

Al incorporation, structural and optical properties of AlxGa1−xN (0.13⩽x⩽0.8) alloys grown by MOCVD

(2008) B. Liu et al.   JOURNAL OF CRYSTAL GROWTH

Deposition of ZrO2 and HfO2 thin films by liquid injection MOCVD and ALD using ansa-metallocene zirconium and hafnium precursors

(2008) Kate Black et al.   JOURNAL OF MATERIALS CHEMISTRY

The surface chemistry of thin film atomic layer deposition (ALD) processes for electronic device manufacturing

(2008) Francisco Zaera   JOURNAL OF MATERIALS CHEMISTRY

Room-temperature Chemical Vapor Deposition of Aluminum and Aluminum Oxides on Alkanethiolate Self-Assembled Monolayers

(2008) Peng Lu et al.   Journal of Physical Chemistry C

Chemisorption of Tetrakis(dimethylamido)titanium on Si(100)-2 × 1: C−H and C−N Bond Reactivity Leading to Low-Temperature Decomposition Pathways

(2008) Juan Carlos F. Rodríguez-Reyes et al.   Journal of Physical Chemistry C

Selective-Area Atomic Layer Deposition Using Poly(methyl methacrylate) Films as Mask Layers

(2008) Elina Färm et al.   Journal of Physical Chemistry C

Atomic layer deposition of titanium nitride from TDMAT precursor

(2008) J. Musschoot et al.   MICROELECTRONIC ENGINEERING

A novel thermally-stable zirconium amidinate ALD precursor for ZrO2 thin films

(2008) B. Lee et al.   MICROELECTRONIC ENGINEERING

Role of surface strain in the subsurface migration of adsorbates on silicon

(2008) Juan Carlos F. Rodríguez-Reyes et al.   PHYSICAL REVIEW B

Structural and Optical Properties of Nanocrystalline Er[sub 2]O[sub 3] Thin Films Deposited by a Versatile Low-Pressure MOCVD Approach

(2007) Maria Losurdo et al.   JOURNAL OF THE ELECTROCHEMICAL SOCIETY