Characterization of Si and SiOxfilms deposited in very high-frequency excited atmospheric-pressure plasma and their application to bottom-gate thin film transistors

Effects of mechanical strain on amorphous silicon thin-film transistor electrical stability

(2013) M. J. Chow et al.   APPLIED PHYSICS LETTERS

Atmospheric-pressure low-temperature plasma processes for thin film deposition

(2013) Hiroaki Kakiuchi et al.   JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A

Effective phase control of silicon films during high-rate deposition in atmospheric-pressure very high-frequency plasma: Impacts of gas residence time on the performance of bottom-gate thin film transistors

(2013) H. Kakiuchi et al.   SURFACE & COATINGS TECHNOLOGY

Silicon Oxide Coatings with Very High Rates (>10 nm/s) by Hexamethyldisiloxane-Oxygen Fed Atmospheric-Pressure VHF Plasma: Film-Forming Behavior Using Cylindrical Rotary Electrode

(2012) Hiroaki Kakiuchi et al.   PLASMA CHEMISTRY AND PLASMA PROCESSING

Atmospheric Pressure Low Temperature Direct Plasma Technology: Status and Challenges for Thin Film Deposition

(2012) Francoise Massines et al.   Plasma Processes and Polymers

Atmospheric plasmas for thin film deposition: A critical review

(2012) Delphine Merche et al.   THIN SOLID FILMS

Status and potential of atmospheric plasma processing of materials

(2011) Daphne Pappas   JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A

Ultraflexible amorphous silicon transistors made with a resilient insulator

(2010) Lin Han et al.   APPLIED PHYSICS LETTERS

Ar/HMDSO/O2 Fed Atmospheric Pressure DBDs: Thin Film Deposition and GC-MS Investigation of By-Products

(2010) Fiorenza Fanelli et al.   Plasma Processes and Polymers

Cold atmospheric plasma: Sources, processes, and applications

(2010) L. Bárdos et al.   THIN SOLID FILMS

Microcrystalline Si films grown at low temperatures (90–220 °C) with high rates in atmospheric-pressure VHF plasma

(2009) Hiroaki Kakiuchi et al.   JOURNAL OF APPLIED PHYSICS