Atmospheric-pressure low-temperature plasma processes for thin film deposition

Published 2013 View Full Article

Title

Atmospheric-pressure low-temperature plasma processes for thin film deposition

Authors

Keywords

-

Journal

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A

Volume 32, Issue 3, Pages 030801

Publisher

American Vacuum Society

Online

2013-11-03

DOI

10.1116/1.4828369

Ask authors/readers for more resources

Protocol

Community support

Reagent

Community support

Reprint

Contact the author

Find Funding. Review Successful Grants.

Explore over 25,000 new funding opportunities and over 6,000,000 successful grants.

Explore

Discover Peeref hubs

Discuss science. Find collaborators. Network.

Join a conversation

© Peeref 2019-2024. All rights reserved.