Effective phase control of silicon films during high-rate deposition in atmospheric-pressure very high-frequency plasma: Impacts of gas residence time on the performance of bottom-gate thin film transistors

Published 2013 View Full Article

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Title
Effective phase control of silicon films during high-rate deposition in atmospheric-pressure very high-frequency plasma: Impacts of gas residence time on the performance of bottom-gate thin film transistors
Authors
Keywords
-
Journal
SURFACE & COATINGS TECHNOLOGY
Volume 234, Issue -, Pages 2-7
Publisher
Elsevier BV
Online
2013-07-04
DOI
10.1016/j.surfcoat.2013.06.108

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