Silicon Oxide Coatings with Very High Rates (>10 nm/s) by Hexamethyldisiloxane-Oxygen Fed Atmospheric-Pressure VHF Plasma: Film-Forming Behavior Using Cylindrical Rotary Electrode
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Title
Silicon Oxide Coatings with Very High Rates (>10 nm/s) by Hexamethyldisiloxane-Oxygen Fed Atmospheric-Pressure VHF Plasma: Film-Forming Behavior Using Cylindrical Rotary Electrode
Authors
Keywords
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Journal
PLASMA CHEMISTRY AND PLASMA PROCESSING
Volume 32, Issue 3, Pages 533-545
Publisher
Springer Nature
Online
2012-03-09
DOI
10.1007/s11090-012-9363-2
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