Analysis of intrinsic reverse leakage current resulting from band-to-band tunneling in dislocation-free GaN p–n junctions
出版年份 2021 全文链接
标题
Analysis of intrinsic reverse leakage current resulting from band-to-band tunneling in dislocation-free GaN p–n junctions
作者
关键词
-
出版物
Applied Physics Express
Volume 14, Issue 11, Pages 114001
出版商
IOP Publishing
发表日期
2021-09-25
DOI
10.35848/1882-0786/ac2a03
参考文献
相关参考文献
注意:仅列出部分参考文献,下载原文获取全部文献信息。- Impact ionization coefficients and critical electric field in GaN
- (2021) Takuya Maeda et al. JOURNAL OF APPLIED PHYSICS
- Increase of reverse leakage current at homoepitaxial GaN p-n junctions induced by continuous forward current stress
- (2021) Tetsuo Narita et al. APPLIED PHYSICS LETTERS
- High quality GaN crystal grown by hydride vapor-phase epitaxy on SCAATTM
- (2020) Kenji Iso et al. Applied Physics Express
- Tunneling Current in 4H-SiC p-n Junction Diodes
- (2020) M. Kaneko et al. IEEE TRANSACTIONS ON ELECTRON DEVICES
- GaN substrates having a low dislocation density and a small off-angle variation prepared by hydride vapor phase epitaxy and maskless-3D
- (2020) Takehiro Yoshida et al. JAPANESE JOURNAL OF APPLIED PHYSICS
- Design and Fabrication of GaN p-n Junction Diodes With Negative Beveled-Mesa Termination
- (2019) Takuya Maeda et al. IEEE ELECTRON DEVICE LETTERS
- Structural and Electrical Characterization of 2” Ammonothermal Free-Standing GaN Wafers. Progress toward Pilot Production
- (2019) Daryl Key et al. Materials
- Demonstration of 1200 V / 1.4 mΩ cm2 vertical GaN planar MOSFET fabricated by an all ion implantation process
- (2019) Ryo Tanaka et al. JAPANESE JOURNAL OF APPLIED PHYSICS
- Experimental characterization of impact ionization coefficients for electrons and holes in GaN grown on bulk GaN substrates
- (2018) Lina Cao et al. APPLIED PHYSICS LETTERS
- Correlation between dislocations and leakage current of p-n diodes on a free-standing GaN substrate
- (2018) Shigeyoshi Usami et al. APPLIED PHYSICS LETTERS
- The origin of carbon-related carrier compensation in p-type GaN layers grown by MOVPE
- (2018) JOURNAL OF APPLIED PHYSICS
- First Demonstration of AlSiO as Gate Dielectric in GaN FETs; Applied to a High Performance OG-FET
- (2017) Chirag Gupta et al. IEEE ELECTRON DEVICE LETTERS
- Challenges and future perspectives in HVPE-GaN growth on ammonothermal GaN seeds
- (2016) M Bockowski et al. SEMICONDUCTOR SCIENCE AND TECHNOLOGY
- The Impact of Defects on GaN Device Behavior: Modeling Dislocations, Traps, and Pits
- (2016) Victor Moroz et al. ECS Journal of Solid State Science and Technology
- 1.8 mΩ·cm2vertical GaN-based trench metal–oxide–semiconductor field-effect transistors on a free-standing GaN substrate for 1.2-kV-class operation
- (2015) Tohru Oka et al. Applied Physics Express
- High breakdown single-crystal GaN p-n diodes by molecular beam epitaxy
- (2015) Meng Qi et al. APPLIED PHYSICS LETTERS
- Origin and Control of OFF-State Leakage Current in GaN-on-Si Vertical Diodes
- (2015) Yuhao Zhang et al. IEEE TRANSACTIONS ON ELECTRON DEVICES
- Reliability studies of vertical GaN devices based on bulk GaN substrates
- (2015) Isik C. Kizilyalli et al. MICROELECTRONICS RELIABILITY
- 1.5-kV and 2.2-m \(\Omega \) -cm \(^{2}\) Vertical GaN Transistors on Bulk-GaN Substrates
- (2014) Hui Nie et al. IEEE ELECTRON DEVICE LETTERS
- Transport-mechanism analysis of the reverse leakage current in GaInN light-emitting diodes
- (2011) Qifeng Shan et al. APPLIED PHYSICS LETTERS
Add your recorded webinar
Do you already have a recorded webinar? Grow your audience and get more views by easily listing your recording on Peeref.
Upload NowCreate your own webinar
Interested in hosting your own webinar? Check the schedule and propose your idea to the Peeref Content Team.
Create Now