Surface passivation for ultrathin Al2O3layers grown at low temperature by thermal atomic layer deposition

Influence of annealing and Al2O3 properties on the hydrogen-induced passivation of the Si/SiO2 interface

(2012) G. Dingemans et al.   JOURNAL OF APPLIED PHYSICS

Electronic and chemical properties of the c-Si/Al2O3 interface

(2011) Florian Werner et al.   JOURNAL OF APPLIED PHYSICS

Deposition Temperature and Thermal Annealing Effects on the Electrical Characteristics of Atomic Layer Deposited Al2O3 Films on Silicon

(2011) J. M. Rafí et al.   JOURNAL OF THE ELECTROCHEMICAL SOCIETY

19.4%-efficient large-area fully screen-printed silicon solar cells

(2011) Sebastian Gatz et al.   Physica Status Solidi-Rapid Research Letters

Excellent silicon surface passivation with 5 Å thin ALD Al2O3 layers: Influence of different thermal post-deposition treatments

(2011) Armin Richter et al.   Physica Status Solidi-Rapid Research Letters

Contact passivation in silicon solar cells using atomic-layer-deposited aluminum oxide layers

(2011) Dimitri Zielke et al.   Physica Status Solidi-Rapid Research Letters

Role of field-effect on c-Si surface passivation by ultrathin (2–20 nm) atomic layer deposited Al2O3

(2010) N. M. Terlinden et al.   APPLIED PHYSICS LETTERS

Hydrogen induced passivation of Si interfaces by Al2O3 films and SiO2/Al2O3 stacks

(2010) G. Dingemans et al.   APPLIED PHYSICS LETTERS

Influence of the Deposition Temperature on the c-Si Surface Passivation by Al[sub 2]O[sub 3] Films Synthesized by ALD and PECVD

(2010) G. Dingemans et al.   ELECTROCHEMICAL AND SOLID STATE LETTERS

Influence of the Oxidant on the Chemical and Field-Effect Passivation of Si by ALD Al[sub 2]O[sub 3]

(2010) G. Dingemans et al.   ELECTROCHEMICAL AND SOLID STATE LETTERS

Role of hydrogen in the surface passivation of crystalline silicon by sputtered aluminum oxide

(2010) Tsu-Tsung Andrew Li et al.   PROGRESS IN PHOTOVOLTAICS

Development status of high-efficiency HIT solar cells

(2010) Takahiro Mishima et al.   SOLAR ENERGY MATERIALS AND SOLAR CELLS

Investigation of interfacial layer development between thin Al2O3 films grown using atomic layer deposition and Si(100), Ge(100), or GaAs(100)

(2009) L. Lamagna et al.   JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A

High-efficiency hydrogenated amorphous/crystalline Si heterojunction solar cells

(2009) Qi Wang   PHILOSOPHICAL MAGAZINE

Silicon surface passivation by ultrathin Al2O3films synthesized by thermal and plasma atomic layer deposition

(2009) G. Dingemans et al.   Physica Status Solidi-Rapid Research Letters

High efficiency n-type Si solar cells on Al2O3-passivated boron emitters

(2008) Jan Benick et al.   APPLIED PHYSICS LETTERS

On the c-Si surface passivation mechanism by the negative-charge-dielectric Al2O3

(2008) B. Hoex et al.   JOURNAL OF APPLIED PHYSICS

Surface passivation of high-efficiency silicon solar cells by atomic-layer-deposited Al2O3

(2008) J. Schmidt et al.   PROGRESS IN PHOTOVOLTAICS