Low leakage Ru-strontium titanate-Ru metal-insulator-metal capacitors for sub-20 nm technology node in dynamic random access memory

Title
Low leakage Ru-strontium titanate-Ru metal-insulator-metal capacitors for sub-20 nm technology node in dynamic random access memory
Authors
Keywords
-
Journal
APPLIED PHYSICS LETTERS
Volume 104, Issue 8, Pages 082908
Publisher
AIP Publishing
Online
2014-02-27
DOI
10.1063/1.4866860

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