Preparation of Ag2O modified silica abrasives and their chemical mechanical polishing performances on sapphire

Preparation of Mg-Doped Colloidal Silica Abrasives and Their Chemical Mechanical Polishing Performances on Sapphire

(2016) Pan Ma et al.   JOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY

Fe-Nx/C assisted chemical–mechanical polishing for improving the removal rate of sapphire

(2015) Li Xu et al.   APPLIED SURFACE SCIENCE

A study of chemical products formed on sapphire (0001) during chemical–mechanical polishing

(2015) Xiaolei Shi et al.   SURFACE & COATINGS TECHNOLOGY

Evaluation of environmental impacts during chemical mechanical polishing (CMP) for sustainable manufacturing

(2013) Hyunseop Lee et al.   Journal of Mechanical Science and Technology

Mechanism of the interaction between Al2O3 and SiO2 during the chemical-mechanical polishing of sapphire with silicon dioxide

(2012) E. A. Vovk et al.   Journal of Surface Investigation-X-Ray Synchrotron and Neutron Techniques

Ultrasonic flexural vibration assisted chemical mechanical polishing for sapphire substrate

(2010) Wenhu Xu et al.   APPLIED SURFACE SCIENCE

Effects of the ultrasonic flexural vibration on the interaction between the abrasive particles; pad and sapphire substrate during chemical mechanical polishing (CMP)

(2010) Wenhu Xu et al.   APPLIED SURFACE SCIENCE

Preparation of silica/ceria nano composite abrasive and its CMP behavior on hard disk substrate

(2009) Hong Lei et al.   MICROELECTRONIC ENGINEERING