One-Step Synthesis of Silicon Oxynitride Films Using a Steady-State and High-Flux Helicon-Wave Excited Nitrogen Plasma

Title
One-Step Synthesis of Silicon Oxynitride Films Using a Steady-State and High-Flux Helicon-Wave Excited Nitrogen Plasma
Authors
Keywords
Nitrogen helicon plasma, Silicon oxynitride (SiON) films, Mixture compositions, Ion energy distributions, XPS
Journal
PLASMA CHEMISTRY AND PLASMA PROCESSING
Volume 37, Issue 4, Pages 1237-1247
Publisher
Springer Nature
Online
2017-05-19
DOI
10.1007/s11090-017-9822-x

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