Fundamentals of atomic and close-to-atomic scale manufacturing: a review
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Title
Fundamentals of atomic and close-to-atomic scale manufacturing: a review
Authors
Keywords
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Journal
International Journal of Extreme Manufacturing
Volume 4, Issue 1, Pages 012001
Publisher
IOP Publishing
Online
2021-11-21
DOI
10.1088/2631-7990/ac3bb2
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Note: Only part of the references are listed.- Area Selective Deposition: Fundamentals, Applications and Future Outlook
- (2020) Gregory N. Parsons et al. CHEMISTRY OF MATERIALS
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- (2019) Peter Ozaveshe Oviroh et al. SCIENCE AND TECHNOLOGY OF ADVANCED MATERIALS
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- (2018) Volker L. Deringer et al. FARADAY DISCUSSIONS
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- (2018) А Kozlovskiy et al. Materials Research Express
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- (2018) Giang D. Nguyen et al. PHYSICAL REVIEW LETTERS
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- (2018) Adriaan J. M. Mackus et al. CHEMISTRY OF MATERIALS
- Aberration-Corrected Electron Beam Lithography at the One Nanometer Length Scale
- (2017) Vitor R. Manfrinato et al. NANO LETTERS
- Advanced anode for sodium-ion battery with promising long cycling stability achieved by tuning phosphorus-carbon nanostructures
- (2017) Zhaoxin Yu et al. Nano Energy
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- (2016) I. R. Shein et al. JOURNAL OF STRUCTURAL CHEMISTRY
- Electron Elevator: Excitations across the Band Gap via a Dynamical Gap State
- (2016) A. Lim et al. PHYSICAL REVIEW LETTERS
- Engineering the magnetic coupling and anisotropy at the molecule–magnetic surface interface in molecular spintronic devices
- (2016) Victoria E. Campbell et al. Nature Communications
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- (2016) P. Olsson et al. Materials Research Letters
- Gold Nanobipyramid-Supported Silver Nanostructures with Narrow Plasmon Linewidths and Improved Chemical Stability
- (2015) Xingzhong Zhu et al. ADVANCED FUNCTIONAL MATERIALS
- Constructing high-dimensional neural network potentials: A tutorial review
- (2015) Jörg Behler INTERNATIONAL JOURNAL OF QUANTUM CHEMISTRY
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- (2015) A.P. Thompson et al. JOURNAL OF COMPUTATIONAL PHYSICS
- Nanopatterning and Electrical Tuning of MoS2 Layers with a Subnanometer Helium Ion Beam
- (2015) Daniel S. Fox et al. NANO LETTERS
- First principles study of the atomic layer deposition of alumina by TMA–H2O-process
- (2015) Timo Weckman et al. PHYSICAL CHEMISTRY CHEMICAL PHYSICS
- Electron-beam induced nano-etching of suspended graphene
- (2015) Benedikt Sommer et al. Scientific Reports
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- (2014) Carlos-Andres Palma et al. JOURNAL OF THE AMERICAN CHEMICAL SOCIETY
- Advances in source technology for focused ion beam instruments
- (2014) Noel S. Smith et al. MRS BULLETIN
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- (2014) Ari Ojanperä et al. PHYSICAL REVIEW B
- Vertical atomic manipulation with dynamic atomic-force microscopy without tip change via a multi-step mechanism
- (2014) J. Bamidele et al. Nature Communications
- Cold atomic beam ion source for focused ion beam applications
- (2013) B. Knuffman et al. JOURNAL OF APPLIED PHYSICS
- Atomistic kinetic Monte Carlo study of atomic layer deposition derived from density functional theory
- (2013) Mahdi Shirazi et al. JOURNAL OF COMPUTATIONAL CHEMISTRY
- Helium ion microscopy of graphene: beam damage, image quality and edge contrast
- (2013) D Fox et al. NANOTECHNOLOGY
- Progress in Time-Dependent Density-Functional Theory
- (2012) M.E. Casida et al. Annual Review of Physical Chemistry
- A single-atom transistor
- (2012) Martin Fuechsle et al. Nature Nanotechnology
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- (2012) Simon D Elliott SEMICONDUCTOR SCIENCE AND TECHNOLOGY
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- (2011) W F van Dorp et al. NANOTECHNOLOGY
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- (2011) Holger P. Specht et al. NATURE
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- (2011) A. A. Khajetoorians et al. SCIENCE
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- Threshold defect production in germanium determined by density functional theory molecular dynamics simulations
- (2010) E Holmström et al. PHYSICA SCRIPTA
- Stability and Electronic Properties of TiO2 Nanostructures With and Without B and N Doping
- (2009) D. J. Mowbray et al. Journal of Physical Chemistry C
- Plasma atomic layer etching using conventional plasma equipment
- (2009) Ankur Agarwal et al. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A
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- (2009) Oscar Custance et al. Nature Nanotechnology
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- (2008) Michael A. Walsh et al. Annual Review of Physical Chemistry
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- Threshold defect production in silicon determined by density functional theory molecular dynamics simulations
- (2008) E. Holmström et al. PHYSICAL REVIEW B
- Complex Patterning by Vertical Interchange Atom Manipulation Using Atomic Force Microscopy
- (2008) Y. Sugimoto et al. SCIENCE
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