First principles study of the atomic layer deposition of alumina by TMA–H2O-process

Title
First principles study of the atomic layer deposition of alumina by TMA–H2O-process
Authors
Keywords
-
Journal
PHYSICAL CHEMISTRY CHEMICAL PHYSICS
Volume 17, Issue 26, Pages 17322-17334
Publisher
Royal Society of Chemistry (RSC)
Online
2015-06-08
DOI
10.1039/c5cp01912e

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