The importance of singly charged oxygen vacancies for electrical conduction in monoclinic HfO2
Published 2021 View Full Article
- Home
- Publications
- Publication Search
- Publication Details
Title
The importance of singly charged oxygen vacancies for electrical conduction in monoclinic HfO2
Authors
Keywords
-
Journal
JOURNAL OF APPLIED PHYSICS
Volume 129, Issue 2, Pages 025104
Publisher
AIP Publishing
Online
2021-01-08
DOI
10.1063/5.0036024
References
Ask authors/readers for more resources
Related references
Note: Only part of the references are listed.- Exploiting the switching dynamics of HfO2-based ReRAM devices for reliable analog memristive behavior
- (2019) F. Cüppers et al. APL Materials
- Multilevel HfO2-based RRAM devices for low-power neuromorphic networks
- (2019) V. Milo et al. APL Materials
- SIMS study of oxygen diffusion in monoclinic HfO2
- (2018) Michael P. Mueller et al. APPLIED PHYSICS LETTERS
- Ion migration in crystalline and amorphous HfOX
- (2017) Marcel Schie et al. JOURNAL OF CHEMICAL PHYSICS
- Four-Bits-Per-Cell Operation in an HfO2 -Based Resistive Switching Device
- (2017) Gun Hwan Kim et al. Small
- Filament-Induced Anisotropic Oxygen Vacancy Diffusion and Charge Trapping Effects in Hafnium Oxide RRAM
- (2016) Dan Duncan et al. IEEE ELECTRON DEVICE LETTERS
- First-principles thermodynamics and defect kinetics guidelines for engineering a tailored RRAM device
- (2016) Sergiu Clima et al. JOURNAL OF APPLIED PHYSICS
- High-K materials and metal gates for CMOS applications
- (2015) John Robertson et al. MATERIALS SCIENCE & ENGINEERING R-REPORTS
- Engineering of the Chemical Reactivity of the Ti/HfO2 Interface for RRAM: Experiment and Theory.
- (2014) Pauline Calka et al. ACS Applied Materials & Interfaces
- Materials selection for oxide-based resistive random access memories
- (2014) Yuzheng Guo et al. APPLIED PHYSICS LETTERS
- A Review on Resistive Switching in High-k Dielectrics: A Nanoscale Point of View Using Conductive Atomic Force Microscope
- (2014) Mario Lanza Materials
- Ab initioanalysis of the defect structure of ceria
- (2013) T. Zacherle et al. PHYSICAL REVIEW B
- Grain boundaries as preferential sites for resistive switching in the HfO2 resistive random access memory structures
- (2012) M. Lanza et al. APPLIED PHYSICS LETTERS
- A concerted migration mechanism of mixed oxide ion and electron conduction in reduced ceria studied by first-principles density functional theory
- (2012) Masanobu Nakayama et al. PHYSICAL CHEMISTRY CHEMICAL PHYSICS
- High temperature electrical conduction in nanoscale hafnia films under varying oxygen partial pressure
- (2010) Changhyun Ko et al. APPLIED PHYSICS LETTERS
- Electrochemical studies of capacitance in cerium oxide thin films and its relationship to anionic and electronic defect densities
- (2009) William C. Chueh et al. PHYSICAL CHEMISTRY CHEMICAL PHYSICS
Discover Peeref hubs
Discuss science. Find collaborators. Network.
Join a conversationAsk a Question. Answer a Question.
Quickly pose questions to the entire community. Debate answers and get clarity on the most important issues facing researchers.
Get Started