Preparation of Irregular Silica Nanoparticles by the Polymer Templating for Chemical Mechanical Polishing of Sapphire Substrates
出版年份 2019 全文链接
标题
Preparation of Irregular Silica Nanoparticles by the Polymer Templating for Chemical Mechanical Polishing of Sapphire Substrates
作者
关键词
-
出版物
JOURNAL OF ELECTRONIC MATERIALS
Volume -, Issue -, Pages -
出版商
Springer Science and Business Media LLC
发表日期
2019-05-04
DOI
10.1007/s11664-019-07248-w
参考文献
相关参考文献
注意:仅列出部分参考文献,下载原文获取全部文献信息。- Preparation of MgO doped colloidal SiO 2 abrasive and their chemical mechanical polishing performance on c-, r- and a-plane sapphire substrate
- (2018) Da Yin et al. CERAMICS INTERNATIONAL
- Preparation of non-spherical silica composite abrasives by lanthanum ion-induced effect and its chemical–mechanical polishing properties on sapphire substrates
- (2018) Yue Dong et al. JOURNAL OF MATERIALS SCIENCE
- Preparation of γ-alumina/silica core–shell abrasives and their chemical mechanical polishing performances on sapphire substrates
- (2018) Xin Wang et al. Micro & Nano Letters
- Role of Dispersant Agent on Scratch Reduction during Copper Barrier Chemical Mechanical Planarization
- (2018) Yanlei Li et al. ECS Journal of Solid State Science and Technology
- Study on effect of the surface variation of colloidal silica abrasive during chemical mechanical polishing of sapphire
- (2017) Natthaphon Bun-Athuek et al. JAPANESE JOURNAL OF APPLIED PHYSICS
- CMP behavior of alumina/metatitanic acid core–shell abrasives on sapphire substrates
- (2017) Xin Wang et al. PRECISION ENGINEERING-JOURNAL OF THE INTERNATIONAL SOCIETIES FOR PRECISION ENGINEERING AND NANOTECHNOLOGY
- Study on Chemical Mechanical Polishing Performances of Sapphire Wafer (0001) Using Silica-Based Slurry
- (2017) Zefang Zhang et al. ECS Journal of Solid State Science and Technology
- Preparation of Ag2O modified silica abrasives and their chemical mechanical polishing performances on sapphire
- (2017) Baichun Zhang et al. Friction
- Study on planarization machining of sapphire wafer with soft-hard mixed abrasive through mechanical chemical polishing
- (2016) Yongchao Xu et al. APPLIED SURFACE SCIENCE
- Corrosion Investigations of Ruthenium in Potassium Periodate Solutions Relevant for Chemical Mechanical Polishing
- (2016) Jie Cheng et al. JOURNAL OF ELECTRONIC MATERIALS
- Preparation of Monodisperse Ti-Doped Colloidal SiO 2 Composite Abrasives and Their Chemical Mechanical Polishing Performances on Sapphire Substrates
- (2016) Hong Lei et al. ECS Journal of Solid State Science and Technology
- Mechanical model of nanoparticles for material removal in chemical mechanical polishing process
- (2016) Hao Chen et al. Friction
- Preparation of Cu-doped colloidal SiO2 abrasives and their chemical mechanical polishing behavior on sapphire substrates
- (2015) Hong Lei et al. JOURNAL OF MATERIALS SCIENCE-MATERIALS IN ELECTRONICS
- A study of chemical products formed on sapphire (0001) during chemical–mechanical polishing
- (2015) Xiaolei Shi et al. SURFACE & COATINGS TECHNOLOGY
- Effects of ultra-smooth surface atomic step morphology on chemical mechanical polishing (CMP) performances of sapphire and SiC wafers
- (2015) Yan Zhou et al. TRIBOLOGY INTERNATIONAL
- Non-spherical colloidal silica particles—Preparation, application and model
- (2014) Chenliang Liang et al. COLLOIDS AND SURFACES A-PHYSICOCHEMICAL AND ENGINEERING ASPECTS
- Mechanism of the interaction between Al2O3 and SiO2 during the chemical-mechanical polishing of sapphire with silicon dioxide
- (2012) E. A. Vovk et al. Journal of Surface Investigation-X-Ray Synchrotron and Neutron Techniques
- Effect of mechanical process parameters on friction behavior and material removal during sapphire chemical mechanical polishing
- (2011) Zefang Zhang et al. MICROELECTRONIC ENGINEERING
Find Funding. Review Successful Grants.
Explore over 25,000 new funding opportunities and over 6,000,000 successful grants.
ExploreDiscover Peeref hubs
Discuss science. Find collaborators. Network.
Join a conversation