Dynamic Modeling for the Design and Cyclic Operation of an Atomic Layer Deposition (ALD) Reactor

Modeling ALD Surface Reaction and Process Dynamics using Absolute Reaction Rate Theory

(2013) Curtisha D. Travis et al.   CHEMICAL VAPOR DEPOSITION

Atomic Layer Deposition of Nanostructured Materials for Energy and Environmental Applications

(2012) Catherine Marichy et al.   ADVANCED MATERIALS

Emerging Applications of Atomic Layer Deposition for Lithium-Ion Battery Studies

(2012) Xiangbo Meng et al.   ADVANCED MATERIALS

A model-based methodology for the analysis and design of atomic layer deposition processes—Part I: Mechanistic modelling of continuous flow reactors

(2012) A. Holmqvist et al.   CHEMICAL ENGINEERING SCIENCE

Atomic layer deposition: medical and biological applications

(2012) S. A. Skoog et al.   INTERNATIONAL MATERIALS REVIEWS

Atomic-scale simulation of ALD chemistry

(2012) Simon D Elliott   SEMICONDUCTOR SCIENCE AND TECHNOLOGY

Atomic layer deposition for photovoltaics: applications and prospects for solar cell manufacturing

(2012) J A van Delft et al.   SEMICONDUCTOR SCIENCE AND TECHNOLOGY

Surface Loss in Ozone-Based Atomic Layer Deposition Processes

(2011) Harm C.M. Knoops et al.   CHEMISTRY OF MATERIALS

Simple model for atomic layer deposition precursor reaction and transport in a viscous-flow tubular reactor

(2011) Angel Yanguas-Gil et al.   JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A

Method to determine the sticking coefficient of precursor molecules in atomic layer deposition

(2009) M. Rose et al.   APPLIED SURFACE SCIENCE

Atomic Layer Deposition: An Overview

(2009) Steven M. George   CHEMICAL REVIEWS

Quartz Crystal Microbalance Studies of Al2O3Atomic Layer Deposition Using Trimethylaluminum and Water at 125 °C†

(2009) R. A. Wind et al.   JOURNAL OF PHYSICAL CHEMISTRY A

Nucleation and growth of atomic layer deposition of HfO2 gate dielectric layers on silicon oxide: a multiscale modelling investigation

(2009) A. Dkhissi et al.   PHYSICAL CHEMISTRY CHEMICAL PHYSICS

Nucleation kinetics of Ru on silicon oxide and silicon nitride surfaces deposited by atomic layer deposition

(2008) Sung-Soo Yim et al.   JOURNAL OF APPLIED PHYSICS

Multiscale Modeling of the Atomic Layer Deposition of HfO2Thin Film Grown on Silicon: How to Deal with a Kinetic Monte Carlo Procedure

(2008) A. Dkhissi et al.   Journal of Chemical Theory and Computation

Density functional theory and beyond—opportunities for quantum methods in materials modeling semiconductor technology

(2008) Sadasivan Shankar et al.   JOURNAL OF PHYSICS-CONDENSED MATTER

Applications of atomic layer deposition to nanofabrication and emerging nanodevices

(2008) Hyungjun Kim et al.   THIN SOLID FILMS