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Title
Polarization doping for III-nitride optoelectronics
Authors
Keywords
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Journal
PHYSICA STATUS SOLIDI A-APPLICATIONS AND MATERIALS SCIENCE
Volume 210, Issue 7, Pages 1369-1376
Publisher
Wiley
Online
2013-03-18
DOI
10.1002/pssa.201228614
References
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Related references
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- (2011) Sang-Jun Lee et al. JOURNAL OF PHYSICS D-APPLIED PHYSICS
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- Three-dimensional hole gas induced by polarization in (0001)-oriented metal-face III-nitride structure
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- Hole injection and efficiency droop improvement in InGaN/GaN light-emitting diodes by band-engineered electron blocking layer
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- Interband tunnel junctions for wurtzite III-nitride semiconductors based on heterointerface polarization charges
- (2010) Martin F. Schubert PHYSICAL REVIEW B
- Polarization-Induced Hole Doping in Wide-Band-Gap Uniaxial Semiconductor Heterostructures
- (2010) J. Simon et al. SCIENCE
- Mechanism of carrier injection in (Ni/Au)/p-AlxGa1−xN:Mg(0≤x
- (2009) S. Nikishin et al. APPLIED PHYSICS LETTERS
- Polarization-Induced Zener Tunnel Junctions in Wide-Band-Gap Heterostructures
- (2009) John Simon et al. PHYSICAL REVIEW LETTERS
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