Characterization of atomic layer deposition HfO2, Al2O3, and plasma-enhanced chemical vapor deposition Si3N4 as metal–insulator–metal capacitor dielectric for GaAs HBT technology

High Performance Metal-Insulator-Metal Capacitors with Er2O3 on ALD SiO2 for RF Applications

(2011) Thanh Hoa Phung et al.   JOURNAL OF THE ELECTROCHEMICAL SOCIETY

Plasma-Assisted Atomic Layer Deposition: Basics, Opportunities, and Challenges

(2011) H. B. Profijt et al.   JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A

Impact of electrode roughness on metal-insulator-metal tunnel diodes with atomic layer deposited Al2O3 tunnel barriers

(2011) Nasir Alimardani et al.   JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A

Atomic-Layer-Deposited Dielectric Thin Films on a Cu Clad Laminate Substrate for Embedded Metal–Insulator–Metal Capacitor Applications in Printed Circuit Boards

(2010) Tae Joo Park et al.   JOURNAL OF THE ELECTROCHEMICAL SOCIETY

On the Trade-Off Between Quality Factor and Tuning Ratio in Tunable High-Frequency Capacitors

(2009) M. P. J. Tiggelman et al.   IEEE TRANSACTIONS ON ELECTRON DEVICES

Interlevel Dielectric Processes Using PECVD Silicon Nitride, Polyimide, and Polybenzoxazole for GaAs HBT Technology

(2009) Jiro Yota   JOURNAL OF THE ELECTROCHEMICAL SOCIETY

Influence of the electrode material on HfO[sub 2] metal-insulator-metal capacitors

(2009) Ch. Wenger et al.   JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B

Behavior of zirconium oxide films processed from novel monocyclopentadienyl precursors by atomic layer deposition

(2009) Kaupo Kukli et al.   JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B

Plasma-assisted atomic layer deposition of Ta2O5 from alkylamide precursor and remote O2 plasma

(2008) S. B. S. Heil et al.   JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A