New approach for fabrication of annealing-free ferroelectric HfO2-based films at room temperature

标题
New approach for fabrication of annealing-free ferroelectric HfO2-based films at room temperature
作者
关键词
Ferroelectric materials, Ion-beam processing, Sputtering, Phase transformations, Hafnium oxide
出版物
CERAMICS INTERNATIONAL
Volume 47, Issue 19, Pages 27843-27848
出版商
Elsevier BV
发表日期
2021-06-26
DOI
10.1016/j.ceramint.2021.06.212

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