Simple model for atomic layer deposition precursor reaction and transport in a viscous-flow tubular reactor

标题
Simple model for atomic layer deposition precursor reaction and transport in a viscous-flow tubular reactor
作者
关键词
-
出版物
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A
Volume 30, Issue 1, Pages 01A159
出版商
American Vacuum Society
发表日期
2011-12-29
DOI
10.1116/1.3670396

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