The suppression of background doping in selective area growth technique for high performance normally-off AlGaN/GaN MOSFET

Title
The suppression of background doping in selective area growth technique for high performance normally-off AlGaN/GaN MOSFET
Authors
Keywords
Deposition Temperature, Mask Pattern, Selective Area Growth, Background Doping, 2DEG Density
Journal
JOURNAL OF MATERIALS SCIENCE-MATERIALS IN ELECTRONICS
Volume 26, Issue 12, Pages 9753-9758
Publisher
Springer Nature
Online
2015-09-07
DOI
10.1007/s10854-015-3645-4

Ask authors/readers for more resources

Reprint

Contact the author

Create your own webinar

Interested in hosting your own webinar? Check the schedule and propose your idea to the Peeref Content Team.

Create Now

Ask a Question. Answer a Question.

Quickly pose questions to the entire community. Debate answers and get clarity on the most important issues facing researchers.

Get Started