The suppression of background doping in selective area growth technique for high performance normally-off AlGaN/GaN MOSFET

标题
The suppression of background doping in selective area growth technique for high performance normally-off AlGaN/GaN MOSFET
作者
关键词
Deposition Temperature, Mask Pattern, Selective Area Growth, Background Doping, 2DEG Density
出版物
JOURNAL OF MATERIALS SCIENCE-MATERIALS IN ELECTRONICS
Volume 26, Issue 12, Pages 9753-9758
出版商
Springer Nature
发表日期
2015-09-07
DOI
10.1007/s10854-015-3645-4

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