Resistive switching characteristics of nickel silicide layer embedded HfO2 film
Published 2012 View Full Article
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Title
Resistive switching characteristics of nickel silicide layer embedded HfO2 film
Authors
Keywords
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Journal
APPLIED PHYSICS LETTERS
Volume 100, Issue 11, Pages 112901
Publisher
AIP Publishing
Online
2012-03-15
DOI
10.1063/1.3694045
References
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Related references
Note: Only part of the references are listed.- Robust unipolar resistive switching of Co nano-dots embedded ZrO2 thin film memories and their switching mechanism
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- Robust High-Resistance State and Improved Endurance of $\hbox{HfO}_{X}$ Resistive Memory by Suppression of Current Overshoot
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- (2011) Ming-Chi Wu et al. IEEE ELECTRON DEVICE LETTERS
- Nonvolatile Memristive Switching Characteristics of TiO$_{\bm 2}$ Films Embedded With Nickel Nanocrystals
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- Forming-free resistive switching behaviors in Cr-embedded Ga2O3 thin film memories
- (2011) Dai-Ying Lee et al. JOURNAL OF APPLIED PHYSICS
- Controllable Growth of Nanoscale Conductive Filaments in Solid-Electrolyte-Based ReRAM by Using a Metal Nanocrystal Covered Bottom Electrode
- (2010) Qi Liu et al. ACS Nano
- Correlating structural and resistive changes in Ti:NiO resistive memory elements
- (2010) O. Heinonen et al. APPLIED PHYSICS LETTERS
- Effect of ZrOx/HfOx bilayer structure on switching uniformity and reliability in nonvolatile memory applications
- (2010) Joonmyoung Lee et al. APPLIED PHYSICS LETTERS
- Effects of Vanadium Doping on Resistive Switching Characteristics and Mechanisms of $\hbox{SrZrO}_{3}$-Based Memory Films
- (2010) Meng-Han Lin et al. IEEE TRANSACTIONS ON ELECTRON DEVICES
- Nonvolatile and unipolar resistive switching characteristics of pulsed laser ablated NiO films
- (2010) D. Panda et al. JOURNAL OF APPLIED PHYSICS
- Growth of Nickel Silicides in Si and Si/SiOx Core/Shell Nanowires
- (2010) Yung-Chen Lin et al. NANO LETTERS
- Effects of Ti top electrode thickness on the resistive switching behaviors of rf-sputtered ZrO2 memory films
- (2009) Sheng-Yu Wang et al. APPLIED PHYSICS LETTERS
- Improvement of resistive switching characteristics in TiO2 thin films with embedded Pt nanocrystals
- (2009) APPLIED PHYSICS LETTERS
- Reduction in the reset current in a resistive random access memory consisting of NiOx brought about by reducing a parasitic capacitance
- (2008) K. Kinoshita et al. APPLIED PHYSICS LETTERS
- Schottky Barrier Characteristics of Cobalt–Nickel Silicide/n-Si Junctions for Scaled-Si CMOS Applications
- (2008) D. Panda et al. IEEE TRANSACTIONS ON ELECTRON DEVICES
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