Resistive switching characteristics of nickel silicide layer embedded HfO2 film

Title
Resistive switching characteristics of nickel silicide layer embedded HfO2 film
Authors
Keywords
-
Journal
APPLIED PHYSICS LETTERS
Volume 100, Issue 11, Pages 112901
Publisher
AIP Publishing
Online
2012-03-15
DOI
10.1063/1.3694045

Ask authors/readers for more resources

Create your own webinar

Interested in hosting your own webinar? Check the schedule and propose your idea to the Peeref Content Team.

Create Now

Ask a Question. Answer a Question.

Quickly pose questions to the entire community. Debate answers and get clarity on the most important issues facing researchers.

Get Started