Effects of O3 and H2O oxidants on C and N-related impurities in atomic-layer-deposited La2O3 films observed by in situ x-ray photoelectron spectroscopy

Atomic Layer Deposition of Lanthanum-Based Ternary Oxides

(2009) Hongtao Wang et al.   ELECTROCHEMICAL AND SOLID STATE LETTERS

In Situ Infrared Characterization during Atomic Layer Deposition of Lanthanum Oxide

(2009) Jinhee Kwon et al.   Journal of Physical Chemistry C

Electrical properties of atomic-layer-deposited La2O3 films using a novel La formamidinate precursor and ozone

(2009) B. Lee et al.   MICROELECTRONIC ENGINEERING

Half-cycle atomic layer deposition reaction studies of Al2O3 on In0.2Ga0.8As (100) surfaces

(2008) M. Milojevic et al.   APPLIED PHYSICS LETTERS

Detection of a Formate Surface Intermediate in the Atomic Layer Deposition of High-κ Dielectrics Using Ozone

(2008) Jinhee Kwon et al.   CHEMISTRY OF MATERIALS

Al2O3 Atomic Layer Deposition with Trimethylaluminum and Ozone Studied by in Situ Transmission FTIR Spectroscopy and Quadrupole Mass Spectrometry

(2008) David N. Goldstein et al.   Journal of Physical Chemistry C