Resistive switching of in situ and ex situ oxygen plasma treated ZnO thin film deposited by atomic layer deposition

Title
Resistive switching of in situ and ex situ oxygen plasma treated ZnO thin film deposited by atomic layer deposition
Authors
Keywords
Atomic Layer Deposition, Resistive Switching, High Resistance State, Oxygen Plasma Treatment, Hydrogen Impurity
Journal
APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING
Volume 116, Issue 2, Pages 663-669
Publisher
Springer Nature
Online
2014-02-24
DOI
10.1007/s00339-014-8324-4

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