4.3 Article

Single-Walled Carbon Nanotube Dominated Micron-Wide Stripe Patterned-Based Ferroelectric Field-Effect Transistors with HfO2 Defect Control Layer

Journal

NANOSCALE RESEARCH LETTERS
Volume 13, Issue -, Pages -

Publisher

SPRINGER
DOI: 10.1186/s11671-018-2534-1

Keywords

Ferroelectric field-effect transistors (FeFETs); Single-walled carbon nanotube (SWCNT); Nonvolatile memory; Ferroelectric film

Funding

  1. National Natural Science Foundation of China [61564010, 11304273, U1304108]
  2. Applied Basic Research Programs for Youths of Yunnan Province [2014FD017]
  3. Key Applied Basic Research Program of Science and Technology Commission Foundation of Yunnan Province [2013FA035]
  4. Innovative talents of Science and Technology Plan Projects of Yunnan Povince [2012HA007]

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Ferroelectric field-effect transistors (FeFETs) with single-walled carbon nanotube (SWCNT) dominated micron-wide stripe patterned as channel, (Bi,Nd)(4)Ti3O12 films as insulator, and HfO2 films as defect control layer were developed and fabricated. The prepared SWCNT-FeFETs possess excellent properties such as large channel conductance, high on/off current ratio, high channel carrier mobility, great fatigue endurance performance, and data retention. Despite its thin capacitance equivalent thickness, the gate insulator with HfO2 defect control layer shows a low leakage current density of 3.1 x 10(-9) A/cm(2) at a gate voltage of -3 V.

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