Microstructure and electrical properties of thin HfO2 deposited by plasma-enhanced atomic layer deposition

Leakage current through the poly-crystalline HfO2: Trap densities at grains and grain boundaries

(2013) Onofrio Pirrotta et al.   JOURNAL OF APPLIED PHYSICS

Crystallinity of inorganic films grown by atomic layer deposition: Overview and general trends

(2013) Ville Miikkulainen et al.   JOURNAL OF APPLIED PHYSICS

Correction of non-linear thickness effects in HAADF STEM electron tomography

(2012) W. Van den Broek et al.   ULTRAMICROSCOPY

Development of hafnium based high-k materials—A review

(2011) J.H. Choi et al.   MATERIALS SCIENCE & ENGINEERING R-REPORTS

Grain boundary-driven leakage path formation in HfO2 dielectrics

(2011) G. Bersuker et al.   SOLID-STATE ELECTRONICS

Atomic Layer Deposition: An Overview

(2009) Steven M. George   CHEMICAL REVIEWS

Thermal stability of hafnium and hafnium nitride gates on HfO2 gate dielectrics

(2009) Chih-Huang Tsai et al.   JOURNAL OF ALLOYS AND COMPOUNDS

Texture, Twinning, and Metastable “Tetragonal” Phase in Ultrathin Films of HfO[sub 2] on a Si Substrate

(2009) I. MacLaren et al.   JOURNAL OF THE ELECTROCHEMICAL SOCIETY

Comparison of Thermal and Plasma-Enhanced ALD/CVD of Vanadium Pentoxide

(2009) J. Musschoot et al.   JOURNAL OF THE ELECTROCHEMICAL SOCIETY

Growth Kinetics and Crystallization Behavior of TiO[sub 2] Films Prepared by Plasma Enhanced Atomic Layer Deposition

(2008) Qi Xie et al.   JOURNAL OF THE ELECTROCHEMICAL SOCIETY