Chemical kinetics mechanism for chemical mechanical polishing diamond and its related hard-inert materials

Material removal model of ultrasonic elliptical vibration-assisted chemical mechanical polishing for hard and brittle materials

(2017) Defu Liu et al.   INTERNATIONAL JOURNAL OF ADVANCED MANUFACTURING TECHNOLOGY

Activation and mechanochemical breaking of C–C bonds initiate wear of diamond (110) surfaces in contact with silica

(2016) Anke Peguiron et al.   CARBON

Atomistic origins of material removal rate anisotropy in mechanical polishing of diamond crystal

(2016) W.J. Zong et al.   CARBON

Development of an Ultra-finishing technique for single-crystal diamond substrate utilizing an iron tool in H2O2 solution

(2016) Akihisa Kubota et al.   DIAMOND AND RELATED MATERIALS

Polishing mechanism and surface damage analysis of type IIa single crystal diamond processed by mechanical and chemical polishing methods

(2016) Natsuo Tatsumi et al.   DIAMOND AND RELATED MATERIALS

Improvement of material removal rate of single-crystal diamond by polishing using H2O2 solution

(2016) Akihisa Kubota et al.   DIAMOND AND RELATED MATERIALS

Material removal model of chemical mechanical polishing for fused silica using soft nanoparticles

(2016) Defu Liu et al.   INTERNATIONAL JOURNAL OF ADVANCED MANUFACTURING TECHNOLOGY

Fe-Nx/C assisted chemical–mechanical polishing for improving the removal rate of sapphire

(2015) Li Xu et al.   APPLIED SURFACE SCIENCE

Surface-engineered nanoscale diamond films enable remarkable enhancement in thermal conductivity and anisotropy

(2015) Xiangjun Liu et al.   CARBON

Two-step polishing technique for single crystal diamond (100) substrate utilizing a chemical reaction with iron plate

(2015) Akihisa Kubota et al.   DIAMOND AND RELATED MATERIALS

Modeling of material removal in dynamic deterministic polishing

(2015) Ri Pan et al.   INTERNATIONAL JOURNAL OF ADVANCED MANUFACTURING TECHNOLOGY

Effects of ultra-smooth surface atomic step morphology on chemical mechanical polishing (CMP) performances of sapphire and SiC wafers

(2015) Yan Zhou et al.   TRIBOLOGY INTERNATIONAL

Modeling and simulation for the distribution of slurry particles in chemical mechanical polishing

(2014) N. Y. Nguyen et al.   INTERNATIONAL JOURNAL OF ADVANCED MANUFACTURING TECHNOLOGY

Chemical mechanical polishing of thin film diamond

(2013) Evan L.H. Thomas et al.   CARBON

Ultraviolet-irradiated precision polishing of diamond and its related materials

(2013) Junji Watanabe et al.   DIAMOND AND RELATED MATERIALS

Chemical Mechanical Polishing Slurries for Chemically Vapor-Deposited Diamond Films

(2013) Zewei Yuan et al.   JOURNAL OF MANUFACTURING SCIENCE AND ENGINEERING-TRANSACTIONS OF THE ASME

Evaluation of environmental impacts during chemical mechanical polishing (CMP) for sustainable manufacturing

(2013) Hyunseop Lee et al.   Journal of Mechanical Science and Technology

Ultraprecision CMP for sapphire, GaN, and SiC for advanced optoelectronics materials

(2012) Hideo Aida et al.   CURRENT APPLIED PHYSICS

Characterization of 4H-SiC (0001) surface processed by plasma-assisted polishing

(2012) Hui Deng et al.   INTERNATIONAL JOURNAL OF ADVANCED MANUFACTURING TECHNOLOGY

Electroless oxidation of boron-doped diamond surfaces: comparison between four oxidizing agents; Ce4+, MnO4−, H2O2 and S2O82−

(2011) G. Charrier et al.   DIAMOND AND RELATED MATERIALS

Electroless oxidation of diamond surfaces in ceric and ferricyanide solutions: An easy way to produce “C–O” functional groups

(2010) N. Simon et al.   ELECTROCHIMICA ACTA

Chemical effect on the material removal rate in the CMP of silicon wafers

(2010) Y.G. Wang et al.   WEAR

Chemical composition, thermal stability and hydrogen plasma treatment of laser-cut single-crystal diamond surface studied by X-ray Photoelectron Spectroscopy and Atomic Force Microscopy

(2009) A. Gaisinskaya et al.   DIAMOND AND RELATED MATERIALS