Improvement of material removal rate of single-crystal diamond by polishing using H2O2 solution

Published 2016 View Full Article

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Title
Improvement of material removal rate of single-crystal diamond by polishing using H2O2 solution
Authors
Keywords
Polishing, Diamond, Surface smoothing, OH radical, Chemical mechanical polishing, Tribochemical
Journal
DIAMOND AND RELATED MATERIALS
Volume 70, Issue -, Pages 39-45
Publisher
Elsevier BV
Online
2016-10-01
DOI
10.1016/j.diamond.2016.09.028

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