Low temperature deposition of 2D WS2 layers from WF6 and H2S precursors: impact of reducing agents

Title
Low temperature deposition of 2D WS2 layers from WF6 and H2S precursors: impact of reducing agents
Authors
Keywords
-
Journal
CHEMICAL COMMUNICATIONS
Volume 51, Issue 86, Pages 15692-15695
Publisher
Royal Society of Chemistry (RSC)
Online
2015-09-07
DOI
10.1039/c5cc05272f

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