Low temperature deposition of 2D WS2 layers from WF6 and H2S precursors: impact of reducing agents

标题
Low temperature deposition of 2D WS2 layers from WF6 and H2S precursors: impact of reducing agents
作者
关键词
-
出版物
CHEMICAL COMMUNICATIONS
Volume 51, Issue 86, Pages 15692-15695
出版商
Royal Society of Chemistry (RSC)
发表日期
2015-09-07
DOI
10.1039/c5cc05272f

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