The material removal and surface generation mechanism in ultra-precision grinding of silicon wafers

Title
The material removal and surface generation mechanism in ultra-precision grinding of silicon wafers
Authors
Keywords
Wafer self-rotational grinding, Surface topography model, Plastic side flow, Elastic spring back, Brittle fracture
Journal
INTERNATIONAL JOURNAL OF MECHANICAL SCIENCES
Volume 222, Issue -, Pages 107240
Publisher
Elsevier BV
Online
2022-04-07
DOI
10.1016/j.ijmecsci.2022.107240

Ask authors/readers for more resources

Reprint

Contact the author

Publish scientific posters with Peeref

Peeref publishes scientific posters from all research disciplines. Our Diamond Open Access policy means free access to content and no publication fees for authors.

Learn More

Ask a Question. Answer a Question.

Quickly pose questions to the entire community. Debate answers and get clarity on the most important issues facing researchers.

Get Started