Prediction of the surface roughness and material removal rate in chemical mechanical polishing of single-crystal SiC via a back-propagation neural network

Investigation of SiC Single Crystal Polishing by Combination of Anodic Oxidation and Mechanical Polishing

(2020) Xincheng Yin et al.   International Journal of Electrochemical Science

Training memristor-based multilayer neuromorphic networks with SGD, momentum and adaptive learning rates

(2020) Zheng Yan et al.   NEURAL NETWORKS

Back propagation (BP) neural network prediction and chaotic characteristics analysis of free falling liquid film fluctuation on corrugated plate wall

(2020) Bo Wang et al.   ANNALS OF NUCLEAR ENERGY

The mechanism of Fenton reaction of hydrogen peroxide with single crystal 6H-SiC substrate

(2020) Jiayun Deng et al.   Surfaces and Interfaces

Prediction of material removal rate in chemical mechanical polishing via residual convolutional neural network

(2020) Jiusi Zhang et al.   CONTROL ENGINEERING PRACTICE

Molecular dynamics simulation of SiC removal mechanism in a fixed abrasive polishing process

(2019) Piao Zhou et al.   CERAMICS INTERNATIONAL

A Nanomechanical Analysis of Deformation Characteristics of 6H-SiC Using an Indenter and Abrasives in Different Fixed Methods

(2019) Pan et al.   Micromachines

Novel polystyrene/CeO2-TiO2 multicomponent core/shell abrasives for high-efficiency and high-quality photocatalytic-assisted chemical mechanical polishing of reaction-bonded silicon carbide

(2019) Bo Gao et al.   APPLIED SURFACE SCIENCE

Material removal and interactions between an abrasive and a SiC substrate: A molecular dynamics simulation study

(2019) Van-Thuc Nguyen et al.   CERAMICS INTERNATIONAL

The influences of technological parameters on the ultraviolet photocatalytic reaction rate and photocatalysis-assisted polishing effect for SiC

(2019) Qiusheng Yan et al.   JOURNAL OF CRYSTAL GROWTH

Prediction of coal and gas outburst: A method based on the BP neural network optimized by GASA

(2019) Yaqin Wu et al.   PROCESS SAFETY AND ENVIRONMENTAL PROTECTION

Recurrent feature-incorporated convolutional neural network for virtual metrology of the chemical mechanical planarization process

(2018) Ki Bum Lee et al.   JOURNAL OF INTELLIGENT MANUFACTURING

Emerging trends in wide band gap semiconductors (SiC and GaN) technology for power devices

(2018) Fabrizio Roccaforte et al.   MICROELECTRONIC ENGINEERING

The influence of concentration of hydroxyl radical on the chemical mechanical polishing of SiC wafer based on the Fenton reaction

(2018) Jiabin Lu et al.   PRECISION ENGINEERING-JOURNAL OF THE INTERNATIONAL SOCIETIES FOR PRECISION ENGINEERING AND NANOTECHNOLOGY

Prediction of Material Removal Rate for Chemical Mechanical Planarization Using Decision Tree-Based Ensemble Learning

(2018) Zhixiong Li et al.   JOURNAL OF MANUFACTURING SCIENCE AND ENGINEERING-TRANSACTIONS OF THE ASME

A comparative study on the material removal mechanisms of 6H-SiC polished by semi-fixed and fixed diamond abrasive tools

(2016) Q.F. Luo et al.   WEAR

XPS, UV–vis spectroscopy and AFM studies on removal mechanisms of Si-face SiC wafer chemical mechanical polishing (CMP)

(2014) Yan Zhou et al.   APPLIED SURFACE SCIENCE

Chemical mechanical planarization (CMP) of on-axis Si-face SiC wafer using catalyst nanoparticles in slurry

(2014) Yan Zhou et al.   SURFACE & COATINGS TECHNOLOGY

Modeling and mitigation of pad scratching in chemical–mechanical polishing

(2013) S. Kim et al.   CIRP ANNALS-MANUFACTURING TECHNOLOGY

Chemical mechanical polishing (CMP) of on-axis Si-face 6H-SiC wafer for obtaining atomically flat defect-free surface

(2013) Guoshun Pan et al.   JOURNAL OF MATERIALS SCIENCE-MATERIALS IN ELECTRONICS

Chemical Oxidation of 2,6-Dimethylaniline in the Fenton Process

(2009) Nalinrut Masomboon et al.   ENVIRONMENTAL SCIENCE & TECHNOLOGY

A Study on a Surface Preparation Method for Single-Crystal SiC Using an Fe Catalyst

(2008) Akihisa Kubota et al.   JOURNAL OF ELECTRONIC MATERIALS