Molecular dynamics simulation of SiC removal mechanism in a fixed abrasive polishing process

Published 2019 View Full Article

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Title
Molecular dynamics simulation of SiC removal mechanism in a fixed abrasive polishing process
Authors
Keywords
Mono-crystalline SiC, Double-abrasives, Polishing, Molecular dynamic simulation, Removal mechanism
Journal
CERAMICS INTERNATIONAL
Volume -, Issue -, Pages -
Publisher
Elsevier BV
Online
2019-04-23
DOI
10.1016/j.ceramint.2019.04.180

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