Controlling the plasmonic properties of titanium nitride thin films by radiofrequency substrate biasing in magnetron sputtering
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Title
Controlling the plasmonic properties of titanium nitride thin films by radiofrequency substrate biasing in magnetron sputtering
Authors
Keywords
Titanium nitride thin films, Magnetron sputtering, Plasmonics, Spectroscopic ellipsometry, Electrical resistivity
Journal
APPLIED SURFACE SCIENCE
Volume 554, Issue -, Pages 149543
Publisher
Elsevier BV
Online
2021-03-20
DOI
10.1016/j.apsusc.2021.149543
References
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