Exploring argon plasma effect on ferroelectric Hf0.5Zr0.5O2 thin film atomic layer deposition

Effect of in situ hydrogen plasma on the ferroelectricity of hafnium zirconium oxide films

(2020) Glen Walters et al.   APPLIED PHYSICS LETTERS

Enhanced ferroelectricity in ultrathin films grown directly on silicon

(2020) Suraj S. Cheema et al.   NATURE

Direct comparison of ferroelectric properties in Hf0.5Zr0.5O2 between thermal and plasma-enhanced atomic layer deposition

(2020) Jae Hur et al.   NANOTECHNOLOGY

New development of atomic layer deposition: processes, methods and applications

(2019) Peter Ozaveshe Oviroh et al.   SCIENCE AND TECHNOLOGY OF ADVANCED MATERIALS

Impact of Plasma Treatment on Reliability Performance for HfZrOx-Based Metal-Ferroelectric-Metal Capacitors

(2018) Kuen-Yi Chen et al.   IEEE ELECTRON DEVICE LETTERS

First Demonstration of a Logic-process Compatible Junctionless Ferroelectric FinFET Synapse for Neuromorphic Applications

(2018) Myungsoo Seo et al.   IEEE ELECTRON DEVICE LETTERS

Low-temperature atomic layer epitaxy of AlN ultrathin films by layer-by-layer, in-situ atomic layer annealing

(2017) Huan-Yu Shih et al.   Scientific Reports

Nonvolatile Random Access Memory and Energy Storage Based on Antiferroelectric Like Hysteresis in ZrO2

(2016) Milan Pešić et al.   ADVANCED FUNCTIONAL MATERIALS

Impact of mechanical stress on ferroelectricity in (Hf0.5Zr0.5)O2 thin films

(2016) Takahisa Shiraishi et al.   APPLIED PHYSICS LETTERS

TaN interface properties and electric field cycling effects on ferroelectric Si-doped HfO2 thin films

(2015) Patrick D. Lomenzo et al.   JOURNAL OF APPLIED PHYSICS

Ferroelectric properties and switching endurance of Hf0.5Zr0.5O2films on TiN bottom and TiN or RuO2top electrodes

(2014) Min Hyuk Park et al.   Physica Status Solidi-Rapid Research Letters

Pathways towards ferroelectricity in hafnia

(2014) Tran Doan Huan et al.   PHYSICAL REVIEW B

Evolution of phases and ferroelectric properties of thin Hf0.5Zr0.5O2 films according to the thickness and annealing temperature

(2013) Min Hyuk Park et al.   APPLIED PHYSICS LETTERS

Atomic Layer Deposition of Metal Tellurides and Selenides Using Alkylsilyl Compounds of Tellurium and Selenium

(2009) Viljami Pore et al.   JOURNAL OF THE AMERICAN CHEMICAL SOCIETY