Exploring argon plasma effect on ferroelectric Hf0.5Zr0.5O2 thin film atomic layer deposition
出版年份 2021 全文链接
标题
Exploring argon plasma effect on ferroelectric Hf0.5Zr0.5O2 thin film atomic layer deposition
作者
关键词
-
出版物
JOURNAL OF MATERIALS RESEARCH
Volume -, Issue -, Pages -
出版商
Springer Science and Business Media LLC
发表日期
2021-02-19
DOI
10.1557/s43578-020-00074-5
参考文献
相关参考文献
注意:仅列出部分参考文献,下载原文获取全部文献信息。- Effect of in situ hydrogen plasma on the ferroelectricity of hafnium zirconium oxide films
- (2020) Glen Walters et al. APPLIED PHYSICS LETTERS
- Enhanced ferroelectricity in ultrathin films grown directly on silicon
- (2020) Suraj S. Cheema et al. NATURE
- Direct comparison of ferroelectric properties in Hf0.5Zr0.5O2 between thermal and plasma-enhanced atomic layer deposition
- (2020) Jae Hur et al. NANOTECHNOLOGY
- New development of atomic layer deposition: processes, methods and applications
- (2019) Peter Ozaveshe Oviroh et al. SCIENCE AND TECHNOLOGY OF ADVANCED MATERIALS
- Impact of Plasma Treatment on Reliability Performance for HfZrOx-Based Metal-Ferroelectric-Metal Capacitors
- (2018) Kuen-Yi Chen et al. IEEE ELECTRON DEVICE LETTERS
- First Demonstration of a Logic-process Compatible Junctionless Ferroelectric FinFET Synapse for Neuromorphic Applications
- (2018) Myungsoo Seo et al. IEEE ELECTRON DEVICE LETTERS
- Low-temperature atomic layer epitaxy of AlN ultrathin films by layer-by-layer, in-situ atomic layer annealing
- (2017) Huan-Yu Shih et al. Scientific Reports
- Nonvolatile Random Access Memory and Energy Storage Based on Antiferroelectric Like Hysteresis in ZrO2
- (2016) Milan Pešić et al. ADVANCED FUNCTIONAL MATERIALS
- Impact of mechanical stress on ferroelectricity in (Hf0.5Zr0.5)O2 thin films
- (2016) Takahisa Shiraishi et al. APPLIED PHYSICS LETTERS
- TaN interface properties and electric field cycling effects on ferroelectric Si-doped HfO2 thin films
- (2015) Patrick D. Lomenzo et al. JOURNAL OF APPLIED PHYSICS
- Ferroelectric properties and switching endurance of Hf0.5Zr0.5O2films on TiN bottom and TiN or RuO2top electrodes
- (2014) Min Hyuk Park et al. Physica Status Solidi-Rapid Research Letters
- Pathways towards ferroelectricity in hafnia
- (2014) Tran Doan Huan et al. PHYSICAL REVIEW B
- Evolution of phases and ferroelectric properties of thin Hf0.5Zr0.5O2 films according to the thickness and annealing temperature
- (2013) Min Hyuk Park et al. APPLIED PHYSICS LETTERS
- Atomic Layer Deposition of Metal Tellurides and Selenides Using Alkylsilyl Compounds of Tellurium and Selenium
- (2009) Viljami Pore et al. JOURNAL OF THE AMERICAN CHEMICAL SOCIETY
Publish scientific posters with Peeref
Peeref publishes scientific posters from all research disciplines. Our Diamond Open Access policy means free access to content and no publication fees for authors.
Learn MoreAsk a Question. Answer a Question.
Quickly pose questions to the entire community. Debate answers and get clarity on the most important issues facing researchers.
Get Started