The effect of surface preparation on the protective properties of Al2O3 and HfO2 thin films deposited on cp-titanium by atomic layer deposition

Title
The effect of surface preparation on the protective properties of Al2O3 and HfO2 thin films deposited on cp-titanium by atomic layer deposition
Authors
Keywords
Atomic layer deposition, Alumina, Hafnia, Cp-titanium, Chemical-mechanical polishing
Journal
ELECTROCHIMICA ACTA
Volume 366, Issue -, Pages 137431
Publisher
Elsevier BV
Online
2020-11-06
DOI
10.1016/j.electacta.2020.137431

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