Thickness- and orientation- dependences of Curie temperature in ferroelectric epitaxial Y doped HfO2 films
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Title
Thickness- and orientation- dependences of Curie temperature in ferroelectric epitaxial Y doped HfO2 films
Authors
Keywords
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Journal
JAPANESE JOURNAL OF APPLIED PHYSICS
Volume 59, Issue SG, Pages SGGB04
Publisher
IOP Publishing
Online
2020-02-20
DOI
10.35848/1347-4065/ab6d84
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Note: Only part of the references are listed.- Effects of heat treatment and in situ high-temperature X-ray diffraction study on the formation of ferroelectric epitaxial Y-doped HfO2 film
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