Metallic Copper Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition of Air Stable Precursors 

Title
Metallic Copper Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition of Air Stable Precursors 
Authors
Keywords
-
Journal
ADVANCED ENGINEERING MATERIALS
Volume 19, Issue 2, Pages 1600593
Publisher
Wiley
Online
2016-11-08
DOI
10.1002/adem.201600593

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