Atomic Layer Deposition of Ru Thin Films Using a Ru(0) Metallorganic Precursor and O2
Published 2012 View Full Article
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Title
Atomic Layer Deposition of Ru Thin Films Using a Ru(0) Metallorganic Precursor and O2
Authors
Keywords
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Journal
ECS Journal of Solid State Science and Technology
Volume 2, Issue 3, Pages P47-P53
Publisher
The Electrochemical Society
Online
2012-12-19
DOI
10.1149/2.001303jss
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