The Mobility Enhancement of Indium Gallium Zinc Oxide Transistors via Low-temperature Crystallization using a Tantalum Catalytic Layer
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Title
The Mobility Enhancement of Indium Gallium Zinc Oxide Transistors via Low-temperature Crystallization using a Tantalum Catalytic Layer
Authors
Keywords
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Journal
Scientific Reports
Volume 7, Issue 1, Pages -
Publisher
Springer Nature
Online
2017-09-01
DOI
10.1038/s41598-017-11461-0
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Note: Only part of the references are listed.- Crystallization behavior of amorphous indium–gallium–zinc-oxide films and its effects on thin-film transistor performance
- (2016) Ayaka Suko et al. JAPANESE JOURNAL OF APPLIED PHYSICS
- Reliability of Crystalline Indium–Gallium–Zinc-Oxide Thin-Film Transistors Under Bias Stress With Light Illumination
- (2015) Kyung Park et al. IEEE TRANSACTIONS ON ELECTRON DEVICES
- Light induced instability mechanism in amorphous InGaZn oxide semiconductors
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- In-Ga-Zn-Oxide Semiconductor and Its Transistor Characteristics
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- Improved stability of amorphous zinc tin oxide thin film transistors using molecular passivation
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- Application of dual-heterodyne mixing to optical phase-shift keying
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- Achieving High Field-Effect Mobility in Amorphous Indium-Gallium-Zinc Oxide by Capping a Strong Reduction Layer
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- Metal-induced solid-phase crystallization of amorphous TiO2 thin films
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- Depth analysis of subgap electronic states in amorphous oxide semiconductor, a-In-Ga-Zn-O, studied by hard x-ray photoelectron spectroscopy
- (2011) Kenji Nomura et al. JOURNAL OF APPLIED PHYSICS
- Excimer laser crystallization of InGaZnO4 on SiO2 substrate
- (2011) Tao Chen et al. JOURNAL OF MATERIALS SCIENCE-MATERIALS IN ELECTRONICS
- Localization effect of a current-path in amorphous In–Ga–Zn–O thin film transistors with a highly doped buried-layer
- (2011) Eugene Chong et al. THIN SOLID FILMS
- Highly Stable Transparent Amorphous Oxide Semiconductor Thin-Film Transistors Having Double-Stacked Active Layers
- (2010) Jae Chul Park et al. ADVANCED MATERIALS
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- (2009) Robert A. Street ADVANCED MATERIALS
- Effects of Excimer Laser Annealing on InGaZnO4Thin-Film Transistors Having Different Active-Layer Thicknesses Compared with Those on Polycrystalline Silicon
- (2009) Mitsuru Nakata et al. JAPANESE JOURNAL OF APPLIED PHYSICS
- Formation Mechanism of Solution-Processed Nanocrystalline InGaZnO Thin Film as Active Channel Layer in Thin-Film Transistor
- (2008) Gun Hee Kim et al. JOURNAL OF THE ELECTROCHEMICAL SOCIETY
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