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Title
Optical properties and bandgap evolution of ALD HfSiOx films
Authors
Keywords
HfSiO<sub>x</sub>, VUV, Bandgap
Journal
Nanoscale Research Letters
Volume 10, Issue 1, Pages -
Publisher
Springer Nature
Online
2015-02-04
DOI
10.1186/s11671-014-0724-z
References
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Related references
Note: Only part of the references are listed.- FT IR spectroscopy of silicon oxide and HfSiOx layer formation
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- (2008) G. He et al. JOURNAL OF APPLIED PHYSICS
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