Etch Behavior of ALD Al2O3 on HfSiO and HfSiON Stacks in Acidic and Basic Etchants

Published 2011 View Full Article

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Title
Etch Behavior of ALD Al2O3 on HfSiO and HfSiON Stacks in Acidic and Basic Etchants
Authors
Keywords
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Journal
JOURNAL OF THE ELECTROCHEMICAL SOCIETY
Volume 158, Issue 4, Pages D217
Publisher
The Electrochemical Society
Online
2011-02-24
DOI
10.1149/1.3554729
References
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