Etching-free patterning method for electrical characterization of atomically thin MoSe2films grown by chemical vapor deposition

Title
Etching-free patterning method for electrical characterization of atomically thin MoSe2films grown by chemical vapor deposition
Authors
Keywords
-
Journal
Nanoscale
Volume 6, Issue 21, Pages 12376-12382
Publisher
Royal Society of Chemistry (RSC)
Online
2014-08-11
DOI
10.1039/c4nr03817g

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