Ru Films from Bis(ethylcyclopentadienyl)ruthenium Using Ozone as a Reactant by Atomic Layer Deposition for Capacitor Electrodes

Thermal Atomic Layer Deposition (ALD) of Ru Films for Cu Direct Plating

(2011) Sang-Hyeok Choi et al.   JOURNAL OF THE ELECTROCHEMICAL SOCIETY

Atomic Layer Deposition of Ruthenium Films from (Ethylcyclopentadienyl)(pyrrolyl)ruthenium and Oxygen

(2011) Kaupo Kukli et al.   JOURNAL OF THE ELECTROCHEMICAL SOCIETY

Atomic layer deposition of Ru from CpRu(CO)2Et using O2 gas and O2 plasma

(2011) N. Leick et al.   JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A

Scalability of plasma enhanced atomic layer deposited ruthenium films for interconnect applications

(2011) J. Swerts et al.   JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A

Remote Plasma ALD of Platinum and Platinum Oxide Films

(2009) H. C. M. Knoops et al.   ELECTROCHEMICAL AND SOLID STATE LETTERS

Growth of Noble Metal Ru Thin Films by Liquid Injection Atomic Layer Deposition

(2009) Seong Keun Kim et al.   Journal of Physical Chemistry C

Synthesis and transport properties of SrTiO3−xNy/SrTiO3−δlayered structures produced by microwave-induced plasma nitridation

(2009) A Shkabko et al.   JOURNAL OF PHYSICS D-APPLIED PHYSICS

Characterization and properties of microwave plasma-treated SrTiO3

(2009) Andrey Shkabko et al.   MATERIALS CHEMISTRY AND PHYSICS

High κ for MIM and RRAM applications: Impact of the metallic electrode and oxygen vacancies

(2009) C. Vallée et al.   MICROELECTRONIC ENGINEERING

High-k dielectrics for future generation memory devices (Invited Paper)

(2009) J.A. Kittl et al.   MICROELECTRONIC ENGINEERING

Enhanced Dielectric Properties of SrTiO[sub 3] Films with a SrRuO[sub 3] Seed by Plasma-Enhanced Atomic Layer Deposition

(2008) Ji-Hoon Ahn et al.   ELECTROCHEMICAL AND SOLID STATE LETTERS

Initial Stages of Ruthenium Film Growth in Plasma-Enhanced Atomic Layer Deposition

(2008) Se-Hun Kwon et al.   JOURNAL OF THE ELECTROCHEMICAL SOCIETY

Effect of Sr–Ruthenate Seed Layer on Dielectric Properties of SrTiO[sub 3] Thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition

(2008) Ji-Hoon Ahn et al.   JOURNAL OF THE ELECTROCHEMICAL SOCIETY

Effect oxygen exposure on the quality of atomic layer deposition of ruthenium from bis(cyclopentadienyl)ruthenium and oxygen

(2008) Sang-Joon Park et al.   THIN SOLID FILMS

Thermal and plasma enhanced atomic layer deposition ruthenium and electrical characterization as a metal electrode

(2007) Sang-Joon Park et al.   MICROELECTRONIC ENGINEERING